Generation of large area condenser zone plates with smallest zone width below 40 nm by electron beam lithography

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 465-468

  Schliebe, T ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; FABRICATION; LITHOGRAPHY; OPTICS;

CONDENSER ZONE PLATES;

X RAY MICROSCOPES;

EID: 0031655623     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00108-7     Document Type: Article

References (6)

1. T. Schliebe, G. Schneider and H. Aschoff, Microelectronic Engineering 30 (1996) pp. 513-516
2. S.J. Spector et al., J. Vac. Sci. Technol. B Nov./Dez. 1997
3. G. Schmahl et al., X-Ray Microscopy, Springer, Berlin (1984) pp. 63-74
4. M. Hettwer, in: J. Thieme et al., X-Ray Microscopy and Spectromicroscopy, Springer, Berlin, in press
5. S. Oestreich, to be published
6. G. Schneider, T. Schliebe and H. Aschoff, J. Vac. Sci. Technol. B, Vol. 13, No. 6, (1995) pp. 2809-2812