Hydrogen blister depth in boron and hydrogen coimplanted n-type silicon

Applied Physics Letters

Volumn 75, Issue 25, 1999, Pages 3938-3940

  Hochbauer T ^a   Nastasi, M ^a   Mayer, J W ^b  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040582112     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125500     Document Type: Article

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