X-ray photoelectron spectroscopy of polycrystalline AlN surface exposed to the reactive environment of XeF 2

Applied Surface Science

Volumn 217, Issue 1-4, 2003, Pages 82-87

  Watanabe, Morimichi ^a   Mori, Yukimasa ^a   Ishikawa, Takahiro ^a   Iida, Takashi ^b   Akiyama, Keijiro ^b   Sawabe, Kyoichi ^b   Shobatake, Kosuke ^b  

^a NGK INSULATORS LTD   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

AlF 3; AlN; Corrosion; Plasma reaction; SEM; XPS

Indexed keywords

ALUMINUM NITRIDE; AUGER ELECTRON SPECTROSCOPY; COMPOSITION; CORROSION; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA REACTION;

POLYCRYSTALLINE MATERIALS;

EID: 0038819400     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00577-4     Document Type: Article

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