Atomic force microscopy and x-ray diffraction studies of aluminum-induced crystallization of amorphous silicon in Al/α-Si:H, α-Si:H/Al, and Al/α-Si:H/Al thin film structures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 3, 2003, Pages 1037-1047

  Kishore, Ram ^a   Shaik, Arshad ^b   Naseem, H A ^c   Brown, W D ^c  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b NXP SEMICONDUCTORS   (Netherlands)

^c University of Arkansas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; SILICON; SINGLE CRYSTALS; SURFACE ROUGHNESS; X RAY DIFFRACTION;

MICROROUGHNESS;

THIN FILMS;

EID: 0038794658     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1570847     Document Type: Article

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