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Volumn 4, Issue 2, 2001, Pages
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Aluminum-induced crystallization of amorphous silicon (α-Si:H) at 150°C
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM;
AMORPHOUS FILMS;
ANNEALING;
CRYSTAL STRUCTURE;
CRYSTALLIZATION;
ELECTRON DIFFRACTION;
FILM GROWTH;
NUCLEATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
TRANSMISSION ELECTRON MICROSCOPY;
VACUUM APPLICATIONS;
X RAY DIFFRACTION ANALYSIS;
GLANCING ANGLE X RAY DIFFRACTION;
VACUUM EVAPORATION;
AMORPHOUS SILICON;
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EID: 0035262732
PISSN: 10990062
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1342182 Document Type: Article |
Times cited : (29)
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References (11)
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