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Volumn 4, Issue 2, 2001, Pages

Aluminum-induced crystallization of amorphous silicon (α-Si:H) at 150°C

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS FILMS; ANNEALING; CRYSTAL STRUCTURE; CRYSTALLIZATION; ELECTRON DIFFRACTION; FILM GROWTH; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

EID: 0035262732     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1342182     Document Type: Article
Times cited : (29)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.