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Volumn 16, Issue 2, 1998, Pages 587-589
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The retardation of aluminum-amorphous silicon interaction by phosphine plasma treatment
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0032375674
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.581074 Document Type: Article |
Times cited : (7)
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References (12)
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