Accuracy of nanoscale pitch standards fabricated by laser-focused atomic deposition

Journal of Research of the National Institute of Standards and Technology

Volumn 108, Issue 2, 2003, Pages 99-113

  McClelland, Jabez J ^a   Anderson, William R ^a   Bradley, Curtis C ^a,c   Walkiewicz, Mirek ^a,d   Celotta, Robert J ^a   Jurdik, Erich ^b   Deslattes, Richard D ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^c TEXAS CHRISTIAN UNIVERSITY   (United States)

^d RMIT UNIVERSITY   (Australia)

Author keywords

Atom optics; Atomic ruler; Chromium lines; Laser focusing; Nanoscale standards; Nanotechnology; Pitch standards

Indexed keywords

ARGON; CHROMIUM; DEPOSITION; DIFFRACTION GRATINGS; LASER APPLICATIONS; SAPPHIRE; SUBSTRATES;

NANOSCALE PITCH STANDARDS;

NANOTECHNOLOGY;

EID: 0038786952     PISSN: 1044677X     EISSN: None     Source Type: Journal    
DOI: 10.6028/jres.108.0010     Document Type: Article

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