Preparation and properties of nanoscale multilayered TiN/AlN coatings deposited by plasma enhanced chemical vapor deposition

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 460-463

  Lim, Ju Wan ^a   Lee, Seung Hoon ^a   Lee, Jung Joong ^a  

^a Seoul National University   (South Korea)

Author keywords

Aluminum nitride; Mechanical property; Multilayer; Plasma enhanced chemical vapor deposition; Titanium nitride

Indexed keywords

ALUMINUM NITRIDE; HEAT TREATMENT; MICROHARDNESS; MULTILAYERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STEEL; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

HIGH-SPEED STEEL;

COATINGS;

ALUMINUM NITRIDE; PLASMA TREATMENT; TITANIUM NITRIDE; VAPOR DEPOSITION;

EID: 0038685842     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00199-3     Document Type: Article

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