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Volumn 19, Issue 3, 2001, Pages 743-749
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Study of the early stage of SiO2 growth by a TEOS-O2 plasma mixture using a three-dimensional Monte Carlo model
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Author keywords
[No Author keywords available]
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Indexed keywords
ADHESION;
COMPUTER SIMULATION;
DESORPTION;
MATHEMATICAL MODELS;
MONTE CARLO METHODS;
NUCLEATION;
OXIDATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASMAS;
PROBABILITY DISTRIBUTIONS;
SILICA;
SURFACE PHENOMENA;
ULTRAVIOLET RADIATION;
PLASMA MIXTURES;
TETRAETHOXYSILANE (TEOS);
FILM GROWTH;
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EID: 0035334539
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1362676 Document Type: Article |
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Times cited : (6)
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References (15)
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