SiCl3CCl3 as a novel precursor for chemical vapor deposition of amorphous carbon films

Carbon

Volumn 41, Issue 6, 2003, Pages 1169-1174

  Chang, Yu Hsu ^a   Wang, Lung Shen ^a   Chiu, Hsin Tien ^a   Lee, Chi Young ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

A. Carbon films; B. Chemical vapor deposition

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); QUARTZ; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

HOT-WALL REACTORS;

CARBON;

EID: 0038665345     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0008-6223(03)00022-8     Document Type: Article

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