A carbonaceous thin film made by CVD and its application for a carbon/N-type silicon (C/N-SI) photovoltaic cell

Carbon

Volumn 36, Issue 1-2, 1998, Pages 137-143

  Yu, H A ^a,b   Kaneko, T ^b   Otani, S ^b   Sasaki, Y ^c   Yoshimura, S ^a  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b TOKAI UNIVERSITY   (Japan)

^c GUNMA UNIVERSITY   (Japan)

Author keywords

A. amorphous carbon; B. chemical vapor deposition; C. electrical properties

Indexed keywords

EID: 0038821660     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0008-6223(97)00170-X     Document Type: Article

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