The effect of film resistance on electron field emission from amorphous carbon films

Diamond and Related Materials

Volumn 10, Issue 3-7, 2001, Pages 868-872

  Cui, J B ^a   Robertson, J ^a   Milne, W I ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Amorphous carbon; Electrical properties; Field emission; Fowler Nordheim

Indexed keywords

CARBON; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON EMISSION;

FILM RESISTANCE;

AMORPHOUS FILMS;

DIAMOND-LIKE CARBON;

EID: 0035269262     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00613-0     Document Type: Article

References (12)

1. Talin A.A., Pan L.S., McCarty K.F., Felter T.E. Appl. Phys. Lett. 69:1996;3842.
2. Frolov V.D., Konov V.I., Rossukanyi N.M., et al. Diamond Relat. Mater. 7:1998;695.
3. Zhu W., Kochanski G.P., Jin S. Science. 282:1998;1471.
4. Hart A., Satyanarayana B.S., Milne W.I., Robertson J. Appl. Phys. Lett. 74:1999;1594.
5. Robertson J. Mater. Res. Soc. Symp. Proc. 498:1998;197.
6. Fowler R.H., Nordheim L. Proc. R. Soc. A. 119:1928;173.
7. Levine J.D. J. Vac. Sci. Technol. B. 14:1996;2008.
8. Baptist R., Bachelet F., Constancias C. J. Vac. Sci. Technol. B. 15:1997;385.
9. Constancias C., Baptist R. J. Vac. Sci. Technol. B. 16:1998;841.
10. Cui J.B., Stammler M., Ristein J., Ley L. J. Appl. Phys. 88:2000;3667.
11. Luginsland J.W., Valfells A., Lau Y.Y. Appl. Phys. Lett. 69:1996;2770.
12. Jensen K.L., Kodis M.A., Murphy R.A., Zaidman E.G. J. Appl. Phys. 82:1997;845.