Standing wave enhancement of red absorbance and photocurrent in dye-sensitized titanium dioxide photoelectrodes coupled to photonic crystals

Journal of the American Chemical Society

Volumn 125, Issue 20, 2003, Pages 6306-6310

  Nishimura, Suzushi ^a,b   Abrams, Neal ^a   Lewis, Bradley A ^a   Halaoui, Lara I ^a,c   Mallouk, Thomas E ^a   Benkstein, Kurt D ^d   Van de Lagemaat, Jao ^d   Frank, Arthur J ^d  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b JAPAN ENERGY CORPORATION   (Japan)

^c AMERICAN UNIVERSITY OF BEIRUT   (Lebanon)

^d NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CRYSTALS; DYES; ELECTROCHEMICAL ELECTRODES; PHOTOCURRENTS; THIN FILMS;

PHOTOELECTRODES;

TITANIUM DIOXIDE;

DYE; TITANIUM DIOXIDE;

ABSORPTION; ARTICLE; CRYSTAL STRUCTURE; ELECTRIC CURRENT; ELECTRODE; LIGHT INTENSITY; REACTION ANALYSIS; SPECTRAL SENSITIVITY; VELOCITY;

EID: 0038626734     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja034650p     Document Type: Article

References (36)

1. (a) O'Regan, B.; Grätzel, M. Nature 1991, 353, 737.
2. (b) Kalyanasundaram, K.; Grätzel, M. Coord. Chem. Rev. 1998, 77, 347.
3. Tachibana, Y.; Hara, K.; Sayama, K.; Arakawa, H. Chem. Mater. 2002, 14, 2527.
4. Usami, A. Chem. Phys. Lett. 1997, 277, 105.
5. Schuurmans, F. J. P.; Vanmaekelbergh, D.; van de Lagemaat, J.; Lagendijk, A. Science 1999, 284, 141.
6. (a) Carlson, R. J.; Asher, S. A. Appl. Spectroscopy 1984, 38, 297.
7. (b) Flaugh, P. L.; O'Donnell, S. E.; Asher, S. A. Appl. Spectroscopy 1984, 38, 847.
8. Yablonovitch, E. Phys. Rev. Lett. 1987, 58, 2059.
9. Yamamoto, Y.; Slusher, R. E. Phys. Today, 1993, 46(6), 66.
10. Mekis, A. et al., Phys. Rev. Lett. 1996, 77, 3787.
11. Joannopoulos, J. D.; Meads, R. D.; Winn, J. N. Photonic Crystals: Molding the Flow of Light; Princeton University Press: Princeton, 1995; pp 94-97.
12. (a) Tyan, R. et al., J. Opt. Soc. Am. A 1997, 14, 1627.
13. (b) Ohtera, Y.; Sato, T.; Kawashima, T.; Tamamura, T.; Kawakami, S. Electron. Lett. 1999, 35, 1271.
14. Li, L.-M. Appl. Phys. Lett. 2001, 78, 3400.
15. Kosaka, H. Phys. Rev. B 1998, 58, R10096.
16. Sakoda, K. J. Opt. Soc. Am. B 1999, 16, 361.
17. Batterman, B. W.; Cole, H. Rev. Mod. Phys. 1964, 36, 681.
18. Wang, W.; Asher, S. A. J. Am. Chem. Soc. 2001, 123, 12528.
19. th ed.; CRC press: Boca Raton, 1988.
20. Wijnhoven, J. E. G. J.; Vos, W. L. Science 1998, 281, 802.
21. Holland, B. T.; Blanford, C. F.; Stein, A. Science 1998, 281, 538.
22. Holland, B. T.; Blanford, C. F.; Do, T.; Stein, A. Chem. Mater. 1999, 11, 795.
23. Richel, A.; Johnson, N. P.; McComb, D. W.; Appl. Phys. Lett. 2000, 76, 1816.
24. Turner, M. E.; Trentler, T. J.; Colvin, V. L. Adv. Mater. 2001, 13, 180.
25. Vlasov, Y. A.; Bo, X.-Z.; Sturm, J. C.; Norris, D. J. Nature 2001, 414, 289.
26. Schroden, R. C. Al-Daous, M. Blanford, C. F. Stein, A. Chem. Mater. 2002, 14, 3305.
27. Jiang, P.; Bertone, J. F.; Hwang, K. S.; Colvin, V. L. Chem. Mater. 1999, 11, 2132.
28. Nishimura, S., Shishido, A., Abrams, N., Mallouk, T. E. Appl. Phys. Lett. 2002, 81, 4532.
29. Kishimoto, H.; Takahama, K.; Hashimoto, N.; Aoi, Y.; Deki, S. J. Mater. Chem. 1998, 8, 2019.
30. Deki, S. Aoi, Y. J. Mater. Res. 1998, 13, 883.
31. Koumoto, K.; Seo, S.; Sugiyama, T.; Seo, W. S. Chem. Mater. 1999, 11, 2305.
32. Shimizu, K.; Imai, H.; Hirashima, H.; Tsukuma, K. Thin Solid Films 1999, 351, 220.
33. Imai, H. Takei, Y. Shimizu, K. Matsuda, M. Hirashima, H. J. Mater. Chem. 1999, 9, 2971.
34. Yamabi, S.; Imai, H. Chem. Mater. 2002, 14, 609.
35. Henry, C. H. J. Appl. Phys. 1980, 51, 4494.
36. Huynh, W. U. Dittmer, J. J. Alivisatos, A. P. Science 2002, 295, 2425.