High-stability hydrogenated amorphous silicon films for light-soaking prepared by catalytic CVD at high deposition rates

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 138-141

  Itoh, Masaya ^a   Ishibashi, Yoriko ^a   Masuda, Atsushi ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Catalytic chemical vapor deposition; Dangling bond; Hydrogen bonding configurations; Hydrogen content; Hydrogenated amorphous silicon

Indexed keywords

AMORPHOUS SILICON; CATALYST ACTIVITY; CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; HYDROGEN BONDS; HYDROGENATION; PHOTOSENSITIVITY; RATE CONSTANTS; THERMODYNAMIC STABILITY;

LIGHT SOAKING;

THIN FILMS;

EID: 0035801166     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01237-8     Document Type: Conference Paper

References (9)