Deposition of carbon nitride films by an electron-beam-excited plasma sputtering method

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 332-335

  Ban, Masahito ^a,b   Hasegawa, Takeshi ^b   Goto, Akiko ^b   Dake, Yoshinori ^a   Kakudate, Yozo ^c  

^a KAWASAKI HEAVY INDUSTRIES LTD   (Japan)

^b JAPAN FINE CERAMICS CENTER   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Bonding; Carbon nitride; Hardness; Sputtering

Indexed keywords

COMPOSITION; DEPOSITION; ELECTRON BEAMS; NITROGEN; PLASMAS; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC RATIOS;

CARBON NITRIDE;

CARBON NITRIDE; COATING; DEPOSITION; FILM; PLASMA TREATMENT; SURFACE TREATMENT;

EID: 0038469668     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00094-X     Document Type: Article

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