High duty, long lifetime, cathodic arc plasma source

Review of Scientific Instruments

Volumn 74, Issue 6, 2003, Pages 2983-2986

  Wang, L P ^a   Wang, X F ^a   Tang, B Y ^a   Gan, K Y ^a   Peng, X Y ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRIC POTENTIAL; INSULATED GATE BIPOLAR TRANSISTORS; ION IMPLANTATION; MAGNETIC FIELD EFFECTS; VACUUM APPLICATIONS;

CATHODIC ARC PLASMA SOURCES;

PLASMA SOURCES;

EID: 0038449899     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1573746     Document Type: Article

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