Characteristics and design of metal vacuum arc plasma source power supply for pulsed-mode plasma immersion ion implantation

Review of Scientific Instruments

Volumn 71, Issue 12, 2000, Pages 4435-4437

  Wang, L P ^a,b   Gan, K Y ^a,b   Tian, X B ^a   Tang, B Y ^a   Chu, P K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001213453     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1327312     Document Type: Article

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