Effect of fluorine on the diffusion of boron in amorphous silicon

Materials Research Society Symposium - Proceedings

Volumn 717, Issue , 2002, Pages 175-180

  Jacques, J M ^a   Robertson, L S ^a   Jones, K S ^a   Bennett, Joe ^b   Rendon, Mike ^c  

^a UNIVERSITY OF FLORIDA   (United States)

^b SEMATECH   (United States)

^c MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ANNEALING; BORON; DIFFUSION; EPITAXIAL GROWTH; FLUORINE; ION IMPLANTATION; RECRYSTALLIZATION (METALLURGY); SEMICONDUCTOR JUNCTIONS;

TRANSIENT ENHANCED DIFFUSION (TED);

AMORPHOUS SILICON;

EID: 0036447851     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-717-c4.6     Document Type: Conference Paper

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