Effects of ion implantation on electron centers in hydrogenated amorphous carbon films

Journal of Applied Physics

Volumn 93, Issue 10 1, 2003, Pages 5905-5910

  Konchits, A A ^a   Valakh, M Ya ^a   Shanina, B D ^a   Kolesnik, S P ^a   Yanchuk, I B ^a   Carey, J D ^b   Silva, S R P ^b  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; FILM GROWTH; HYDROGENATION; ION IMPLANTATION; PARAMAGNETIC RESONANCE; RAMAN SCATTERING; SUBSTRATES;

ELECTRON CENTERS;

AMORPHOUS FILMS;

EID: 0038312118     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1564280     Document Type: Article

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