Throughput optimization of electron-beam lithography in photomask fabrication regarding acceptable accuracy of critical dimensions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 545-551

  Babin, Sergey ^a   Kuzmin, Igor ^a  

^a Soft Services   (United States)

Author keywords

Distortion; Electron beam lithography; Optimization; Photomask; Resist heating

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; CURRENT DENSITY; ELECTRON BEAM LITHOGRAPHY; HEAT TREATING FURNACES; PHOTORESISTS;

PHOTOMASKS;

MASKS;

EID: 0035763418     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458333     Document Type: Conference Paper

References (5)

1. T. Abe, K. Ohta, H. Wada, T. Takigawa, J. Vac. Sci. Technol., B6, 3 (1988) 853.
2. S. Babin, J. Vac. Sci. Technol., B15 (6) 1997, p.2209.
3. E. Kratschmer, T.R. Groves, J.Vac.Sci. Technol., B8, 6 (1990) 1898.
4. S. Babin, I.Yu. Kuzmin, J.Vac.Sci. Technol., B16 (6) 1998, p.3241.
5. N. Kuwahara, H. Nakagawa, M. Kurihara, N. Hayashi, H. Sano, E. Maruta, T. Takigawa, S. Noguchi, PMJ'99, Proc. SPIE, 3748 (1999) p. 241.