Electrical properties of α-nickel phthalocyanine/aluminium interfaces: Effects of oxygen doping and thermal annealing

Journal of Physics and Chemistry of Solids

Volumn 64, Issue 7, 2003, Pages 1217-1223

  Anthopoulos, T D ^a,b   Shafai, T S ^a  

^a STAFFORDSHIRE UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF ST ANDREWS   (United Kingdom)

Author keywords

Phthalocyanines; Schottky junctions; SCLC; Thermal annealing

Indexed keywords

ADSORPTION; ALUMINUM; BOROSILICATE GLASS; DOPING (ADDITIVES); EVAPORATION; INTERFACES (MATERIALS); OXYGEN; RAPID THERMAL ANNEALING; SANDWICH STRUCTURES; SEMICONDUCTOR JUNCTIONS; SUBSTRATES; VACUUM APPLICATIONS;

SCHOTTKY JUNCTIONS;

SEMICONDUCTING ORGANIC COMPOUNDS;

EID: 0038216875     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3697(03)00062-3     Document Type: Article

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