SCLC measurements in nickel phthalocyanine thin films

Physica Status Solidi (A) Applied Research

Volumn 181, Issue 2, 2000, Pages 569-574

  Anthopoulos, T D ^a   Shafai, T S ^a  

^a STAFFORDSHIRE UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC VARIABLES MEASUREMENT; HOLE TRAPS; PERMITTIVITY MEASUREMENT; SANDWICH STRUCTURES; SUBLIMATION; THICKNESS MEASUREMENT; THIN FILMS; VACUUM APPLICATIONS;

NICKEL PHTHALOCYANINE; OHMIC CONDUCTION; VACUUM THERMAL SUBLIMATION;

NICKEL COMPOUNDS;

EID: 0034294499     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(200010)181:2<569::AID-PSSA569>3.0.CO;2-Y     Document Type: Article

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