Properties of diamond like carbon films by plasma based ion implantation and deposition method applying radio frequency wave and negative high voltage pulses through single feedthrough

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 717-720

  Tojo, H ^a   Mokuno, Y ^a   Chayahara, A ^a   Iura, S ^b   Kasai, H ^b   Toyohara, N ^b   Hidaka, T ^b   Isogawa, S ^b   Hijino, M ^b   Horino, Y ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b OLYMPUS CORPORATION   (Japan)

Author keywords

Adhesion; DLC; Nanoindentation; Plasma based ion implantation; Scratch test; Stress

Indexed keywords

ACETYLENE; ADHESION; COMPRESSIVE STRESS; ELECTRIC POTENTIAL; HARDNESS; ION IMPLANTATION; TUNGSTEN CARBIDE;

NANOINDENTATION;

DIAMOND LIKE CARBON FILMS;

EID: 0038075107     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00870-X     Document Type: Conference Paper

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