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Volumn 42, Issue 4 A, 2003, Pages
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Improved performance of AlGaN/GaN heterojunction field-effect transistors using delta doping and a binary barrier
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Author keywords
Delta doping; Gallium nitride; HEMT; HFET; High electron mobility transistors; MOCVD growth
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Indexed keywords
CARRIER CONCENTRATION;
CARRIER MOBILITY;
CURRENT DENSITY;
GALLIUM NITRIDE;
GATES (TRANSISTOR);
HETEROJUNCTIONS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SILICON CARBIDE;
TRANSCONDUCTANCE;
ALUMINUM GALLIUM NITRIDE;
DELTA DOPING;
HETEROJUNCTION FIELD EFFECT TRANSISTOR;
FIELD EFFECT TRANSISTORS;
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EID: 0038044755
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.42.l353 Document Type: Letter |
Times cited : (7)
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References (7)
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