Photo-assisted MOCVD of copper using Cu(hfa)(COD) as precursor

Applied Surface Science

Volumn 168, Issue 1-4, 2000, Pages 57-60

  Vidal, S ^a   Maury, F ^a   Gleizes, A ^a   Mijoule, C ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; FILM GROWTH; LIGHT ABSORPTION; PHOTOCHEMICAL REACTIONS; PHOTONS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTON IRRADIATION; PRECURSORS;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0034511466     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00588-2     Document Type: Article

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