Effects of post-oxygen plasma treatment on Pt/(Ba,Sr)TiO3/Pt capacitors at low substrate temperatures

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 2 A, 2003, Pages 549-553

  Shye, Der Chi ^a   Hwang, Chuan Chou ^a   Lai, Ming Jiunn ^a   Jaing, Cheng Chung ^b   Chen, Jyh Shin ^b   Huang, Stewart ^c   Juang, Miin Horng ^d   Chiou, Bi Shiou ^a   Cheng, Huang Chung ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b National Science Council   (Taiwan)

^c Mosel Vitelic Incorporation ^*  (Taiwan)

^d NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

BST films; Leakage current; Low temperature; Oxygen plasma; Oxygen vacancies

Indexed keywords

ADHESION; ELECTRIC CONDUCTIVITY; LEAKAGE CURRENTS; PASSIVATION; PERMITTIVITY; PLASMA APPLICATIONS; SPUTTERING; THERMAL EFFECTS;

OXYGEN PLASMA; OXYGEN VACANCIES; POST OXYGEN PLASMA TREATMENT; STRONTIUM TITANATE;

CERAMIC CAPACITORS;

EID: 0038005537     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.549     Document Type: Article

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