Electrical properties of O2 and N2 annealed (Ba,Sr)TiO3 thin films

Integrated Ferroelectrics

Volumn 21, Issue 1 -4 pt 1, 1998, Pages 173-183

  Tsai, M S ^a   Sun, S C ^a   Tseng, T Y ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BARIUM TITANATE; CRYSTALLINE MATERIALS; DEPOSITION; ELECTROCHEMICAL ELECTRODES; LEAKAGE CURRENTS; NITROGEN; OXYGEN; PERMITTIVITY; REFRACTIVE INDEX; THIN FILMS;

POST-DEPOSITION ANNEALING;

DIELECTRIC FILMS;

EID: 0032312459     PISSN: 10584587     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1080/10584589808202061     Document Type: Article

References (5)