Ion implantation range distributions in silicon carbide

Journal of Applied Physics

Volumn 93, Issue 11, 2003, Pages 8903-8909

  Janson, M S ^a   Linnarsson, M K ^a   Hallen A ^a   Svensson, B G ^a,b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b UNIVERSITY OF OSLO   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY CODES; CRYSTALLINE MATERIALS; FUNCTIONS; ION IMPLANTATION; SECONDARY ION MASS SPECTROMETRY;

PEARSON FREQUENCY FUNCTIONS;

SILICON CARBIDE;

EID: 0038003976     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1569666     Document Type: Article

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