Controlling CD variations in a massively parallel pattern generator

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 671-678

  Luberek, Jarek ^a   Carroll, Allen ^a   Sandström, Torbjörn ^a   Karawajczyk, Andrzej ^a  

^a Micronic Laser Systems AB   (Sweden)

Author keywords

CD control; Pattern generation; Spatial light modulator

Indexed keywords

CALIBRATION; COMPUTER SIMULATION; MASKS; MIRRORS; OPTICAL RESOLVING POWER; OPTICAL TRANSFER FUNCTION;

MICROMIRRORS;

LIGHT MODULATORS;

EID: 0036411692     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474615     Document Type: Article

References (1)

1. T. Sandström et al., "Sigma7100: a New Architecture for Laser Pattern Generators for 130 nm and Beyond", SPIE Proc. Vol. 4409, pp. 270-276, 2001.