Dynamic scaling in growth of ZrO2 thin films prepared by electronic beam evaporation

Chinese Physics Letters

Volumn 20, Issue 5, 2003, Pages 709-712

  Qi, Hong Ji ^a   Huang, Li Hua ^b   Yuan, Jing Mei ^a   Cheng, Chuan Fu ^a   Shao, Jian Da ^a   Fan, Zheng Xiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; EVAPORATION; ZIRCONIA;

ATOMIC-FORCE-MICROSCOPY; BEAM EVAPORATION; CORRELATION ANALYSIS; DEPOSITION PROCESS; DYNAMIC SCALING; ELECTRONIC BEAMS; GROWTH FRONT; NUMERICAL CORRELATIONS; ROUGHNESS EXPONENT; THIN-FILMS;

THIN FILMS;

EID: 0037911372     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/20/5/334     Document Type: Article

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