A tracking ellipsometer of picometer sensitivity enabling 0.1% sputtering-rate monitoring of EUV nanometer multilayer fabrication

Thin Solid Films

Volumn 433, Issue 1-2 SPEC., 2003, Pages 224-229

  Yamamoto, M ^a   Hotta, Y ^a   Sato, M ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

EUV multilayer; In situ ellipsometer; Picometer sensitivity; Sputtering rate monitor

Indexed keywords

ELLIPSOMETRY; SPUTTERING; ULTRAVIOLET RADIATION; X RAYS;

PICOMETER SENSITIVITY;

MULTILAYERS;

EID: 0037843109     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00287-6     Document Type: Conference Paper

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