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Volumn 47, Issue 7 SPEC., 2003, Pages 1161-1165

The impact of short channel and quantum effects on the MOS transistor mismatch

Author keywords

Fluctuations; Matching; MOS transistor; Quantum effect; Short channel effect; Threshold voltage

Indexed keywords

COMPUTER SIMULATION; DOPING (ADDITIVES); GATES (TRANSISTOR); QUANTUM ELECTRONICS; THRESHOLD VOLTAGE;

EID: 0037741862     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(03)00033-9     Document Type: Conference Paper
Times cited : (16)

References (11)
  • 1
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    • Experimental study of threshold voltage fluctuations due to statistical variations of channel dopant number in MOSFET's
    • Mizuno T., Okamura J., Toriumi A. Experimental study of threshold voltage fluctuations due to statistical variations of channel dopant number in MOSFET's. IEEE Trans. Elecron. Dev. 41:1994;2216.
    • (1994) IEEE Trans. Elecron. Dev. , vol.41 , pp. 2216
    • Mizuno, T.1    Okamura, J.2    Toriumi, A.3
  • 2
    • 84886448051 scopus 로고    scopus 로고
    • Channel engineering for the reduction of random-dopant-placement-induced threshold voltage fluctuation
    • Takeuchi K, Tatsumi T, Furukawa A. Channel engineering for the reduction of random-dopant-placement-induced threshold voltage fluctuation. In: Proceedings of IEDM. 1997. p. 841.
    • (1997) Proceedings of IEDM. , pp. 841
    • Takeuchi, K.1    Tatsumi, T.2    Furukawa, A.3
  • 5
    • 0016113965 scopus 로고
    • A simple theory to predict the threshold voltage of short-channel IGFET's
    • Yau L. A simple theory to predict the threshold voltage of short-channel IGFET's. Solid State Electron. 17:1974;1059.
    • (1974) Solid State Electron. , vol.17 , pp. 1059
    • Yau, L.1
  • 6
    • 0032624754 scopus 로고    scopus 로고
    • Optimization of Vth roll-off in MOSFET's with advanced channel architecture. Retrograde doping and pockets
    • Gwoziecki R., Skotnicki T., Bouillon P., Gentil P. Optimization of Vth roll-off in MOSFET's with advanced channel architecture. Retrograde doping and pockets. IEEE Trans. Electron. Dev. 46:1999;1551-1561.
    • (1999) IEEE Trans. Electron. Dev. , vol.46 , pp. 1551-1561
    • Gwoziecki, R.1    Skotnicki, T.2    Bouillon, P.3    Gentil, P.4
  • 7
    • 0034868635 scopus 로고    scopus 로고
    • Effect of substrate voltage and oxide thickness on NMOSFET maching characteristics for a 0.18 μm CMOS technology
    • Difrenza R, Llinares P, Granger E, Brut H, Ghibaudo G. Effect of substrate voltage and oxide thickness on NMOSFET maching characteristics for a 0.18 μm CMOS technology. In: Proceedings of ICMTS. 2001. p. 7.
    • (2001) Proceedings of ICMTS , pp. 7
    • Difrenza, R.1    Llinares, P.2    Granger, E.3    Brut, H.4    Ghibaudo, G.5
  • 10
    • 0026852922 scopus 로고
    • Influence of high substrate doping levels on the threshold voltage and the mobility of deep submicrometer MOSFET's
    • Van Dort M., Woerlee P., Walker A., Juffermans C., Lifka H. Influence of high substrate doping levels on the threshold voltage and the mobility of deep submicrometer MOSFET's. IEEE Trans. Electron. Dev. 39:1992;932.
    • (1992) IEEE Trans. Electron. Dev. , vol.39 , pp. 932
    • Van Dort, M.1    Woerlee, P.2    Walker, A.3    Juffermans, C.4    Lifka, H.5
  • 11
    • 0033347829 scopus 로고    scopus 로고
    • Quantum mechanical enhancement of the random dopant induced threshold voltage fluctuations and lowering in sub 0.1 micron MOSFETs
    • Asenov A, Slavcheva G, Brown A, Davies J, Saini S. Quantum mechanical enhancement of the random dopant induced threshold voltage fluctuations and lowering in sub 0.1 micron MOSFETs. In: Proceedings of IEDM. 1999. p. 535.
    • (1999) Proceedings of IEDM , pp. 535
    • Asenov, A.1    Slavcheva, G.2    Brown, A.3    Davies, J.4    Saini, S.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.