Dot formation with 170-nm dimensions using a thermal lithography technique

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 651-656

  Kuwahara, M ^a   Kim, J H ^b   Tominaga, J ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Gaussian distribution; Mastering process; Reversible photoresist; Thermal cross linking; Ultra high density optical disk

Indexed keywords

CROSSLINKING; FOCUSING; LASERS; LITHOGRAPHY; PHOTORESISTS; THERMAL EFFECTS;

THERMAL LITHOGRAPHY;

OPTICAL DISK STORAGE;

EID: 0037682245     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00127-8     Document Type: Conference Paper

References (6)

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