SNOM imaging of very fine pits formed by EB lithography for ultrahigh density optical recording

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 728-735

  Hosaka, Sumio ^a,b   Sone, Hayato ^a   Takahashi, Yoshitaka ^a   Shintani, Toshimichi ^b   Kato, Keizo ^b   Saiki, Toshiharu ^c  

^a GUNMA UNIVERSITY   (Japan)

^b HITACHI LTD   (Japan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Depolarization; EB writing; Near field optics; SNOM; Trillion bit recording

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; IMAGING TECHNIQUES; LIGHT POLARIZATION; LIGHT REFLECTION; MAGNETIC RECORDING; NEAR FIELD SCANNING OPTICAL MICROSCOPY;

DEPOLARIZATION;

OPTICAL RECORDING;

EID: 0037682194     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00133-3     Document Type: Conference Paper

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