The influence of multilayers on the optical performance of extreme ultra violet projection systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4832, Issue , 2002, Pages 149-157

  Bal, Matthieu F ^a   Bociort, Florian ^a   Braat, Joseph J M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

(220.3740) Lithography; (310.6860) thin films; Optical properties

Indexed keywords

COMPUTER SIMULATION; LIGHT ABSORPTION; LITHOGRAPHY; MOLYBDENUM; OPTICAL DESIGN; OPTICAL PROPERTIES; OPTICS; PROJECTION SYSTEMS; SILICON; THICKNESS MEASUREMENT; THIN FILMS; ULTRAVIOLET DEVICES;

DEPTH OF FOCUS; EFFECTIVE REFLECTIVE DEPTH; EXTREME ULTRAVIOLET PROJECTION SYSTEMS; OPTICAL DESIGN SOFTWARE; REFLECTIVE OPTICS;

OPTICAL MULTILAYERS;

EID: 0037673663     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.486478     Document Type: Conference Paper

References (9)

1. M. Bal, F. Bociort, and J. Braat, "The effect of obstructions on the design of reflective ring-field projection systems," in Soft X-Ray and EUV Imaging Systems II, D. Tichenor and J. Folta, eds. (SPIE, San Diego, 2001), pp. 25-31.
2. Mathematica, Wolfram Research Inc., Champaign, 1999.
3. Thin Film Design Software for Windows, Software Spectra Inc., Portland, 1999.
4. H. A. Macleod, Thin-film optical filters, 2 ed. (Adam Hilger Ltd, Bristol, 1986).
5. B. Henke, E. Gullikson, and J. Davis, "X-ray interactions: photoabsorption, scattering, transmission and reflection at E = 50-30,000 eV, Z = 1-92"," At. Data Nucl. 54, 181-342 (1993).
6. C. Liang, M. R. Descour, J. M. Sasian, and S. A. Lerner, "Multilayer-coating-induced aberrations in extreme-ultraviolet lithography optics," Appl. Opt. 40(1), 129-135 (2001).
7. N. J. Duddles, "Effects of Mo/Si multilayer coatings on the imaging characteristics of an extreme-ultraviolet lithography system," Appl. Opt. 37(16), 3533-3538 (1998).
8. F. Cerrina, S. Bollepalli, M. Khan, H. Solak, W. Li, and D. He, "Image formation in EUV lithography: Multilayer and resist properties," Microelectron. Eng. 53(1-4), 13-20 (2000).
9. L. R. Brovelli and U. Keller, "Simple Analytical Expressions for the Reflectivity and the Penetration Depth of a Bragg Mirror between Arbitrary Media," Opt. Commun. 116(4-6), 343-350 (1995).