The effect of obstructions on the design of reflective ring-field projection systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4506, Issue , 2001, Pages 25-31

  Bal, Matthieu F ^a   Bociort, Florian ^a   Braat, Joseph J M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Extreme Ultra Violet (EUV); Lithography; Obscurations; Obstructions; Optical system design

Indexed keywords

CONSTRAINT THEORY; LITHOGRAPHY; MIRRORS; OPTICAL DESIGN; OPTICAL SYSTEMS; OPTIMIZATION; RAY TRACING; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PROJECTION SYSTEMS;

EID: 0035764887     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.450960     Document Type: Conference Paper

References (9)

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