Effects of moysi multilayer coatings on the imaging characteristics of an extreme-ultraviolet lithography system

Applied Optics

Volumn 37, Issue 16, 1998, Pages 3533-3538

  Duddles, N J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009227440     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.003533     Document Type: Article

References (6)

1. T. Jewell, J. M. Rodgers, and K. P. Thompson, “Reflective systems design study for soft-x-ray projection lithography, ” J. Vac. Technol. B 8, 1519-1523 (1990).
2. N. J. Duddles, “Optical performance of Mo/Si multilayer coatings in the EUV: implications for EUV imaging, ” submitted to Appl. Opt. (1997).
3. H. Yamanashi and M. Ito, “Image simulation of extreme ultraviolet lithography optics: effect of multilayer coatings, ” Jpn. J. Appl. Phys. 35, 6475-6479 (1996).
4. B. Lai, F. Cerrina, and J. H. Underwood, “Image formation in multilayers optics: the Schwartzschild objective, ” in Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, G. F. Marshall, ed., Proc. SPIE 563, 174-179 (1985).
5. W. C. Sweatt, “Condenser for illuminating a ring field, ” U.S. patent 5, 361, 292 (1 November 1994).
6. D. G. Stearns, R. S. Rosen, and S. P. Vernon, “Multilayer mirror technology for soft-x-ray projection lithography, ” Appl. Opt. 32, 6952-6960 (1993).