Near-threshold ultraviolet-laser ablation of Kapton film investigated by x-ray photoelectron spectroscopy

Journal of Materials Research

Volumn 18, Issue 1, 2003, Pages 53-59

  Zeng, D W ^a   Yung, K C ^b   Xie, C S ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; COMPOSITION; ETHERS; LASER ABLATION; OXIDATION; PHOTOLYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FREE RADICAL GROUPS;

PLASTIC FILMS;

EID: 0037669663     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2003.0008     Document Type: Article

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