XPS investigation of Upilex-S polyimide ablated by 355 nm Nd:YAG laser irradiation

Applied Surface Science

Volumn 173, Issue 3-4, 2001, Pages 193-202

  Yung, K C ^a   Zeng, D W ^a   Yue, T M ^a  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

LASER ABLATION; NANOSTRUCTURED MATERIALS; NEODYMIUM LASERS; NITROGEN; OXYGEN; PLASTIC FILMS; POLYIMIDES; PULSED LASER APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON CLUSTERS;

SURFACE TREATMENT;

EID: 0034817980     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00884-9     Document Type: Article

References (31)

1. D.H. Lowndes, D.B. Geohegan, A.A. Puretzky, D.P. Norton, C.M. Rouleau, Science 273 (1996) 898.
2. A.M. Morales, C.M. Lieber, Science 279 (1998) 208.
3. M.D. Perry, B.C. Stuart, P.S. Banks, M.D. Feit, V. Yanovsky, A.M. Rubenchik, J. Appl. Phys. 85 (1999) 6803.
4. P. Buck, K. Wiegel, Opt. Quantum Electron. 27 (1995) 1349.
5. W.K.C. Yung, J.S. Liu, H.C. Man, Circuit World 25 (1999) 13.
6. R. Srinivasan, V. Mayne-Banton, Appl. Phys. Lett. 40 (1982) 40.
7. R. Srinivasan, B. Braren, Chem. Rev. 89 (1989) 1303.
8. R. Srinivasan, Appl. Phys. A: Solids Surf. 56 (1993) 417.
9. T. Lippert, S.C. Langford, A. Wokaun, G. Savas, J.T. Dickinson, J. Appl. Phys. 86 (1999) 7116.
10. J. Heitz, J.T. Dickinson, Appl. Phys. A 68 (1999) 515.
11. R. Srinivasan, R.R. Hall, W.D. Loehle, W.D. Wilson, D.C. Allbee, J. Appl. Phys. 78 (1995) 4881.
12. G.B. Blanchet, C.R. FincherJr., Appl. Phys. Lett. 68 (1996) 929.
13. T. Lippert, E. Ortelli, J.C. Panitz, F. Raimondi, J. Wambach, J. Wei, A. Wokaun, Appl. Phys. A 69 (2000) s651.
14. B. Schnyder, J. Wambach, Th. Kunz, Ch. Hahn, R. Kotz, J. Electron Spectrosc. Related Phenom. 105 (1999) 113.
15. D.A. Wesner, M. Aden, J. Gottmann, A. Husmann, E.W. Kreutz, Fresenius J. Anal. Chem. 365 (1999) 183.
16. M.K. Ghosh, K.L. Mittal, Polyimides Fundamentals and Applications, Vol. 222, Marcel Dekker, New York, 1996.
17. L.J. Matienzo, F.D. Egitto, Polym. Degradation Stability 35 (1992) 181.
18. W.K.C. Yung, J.S. Liu, H.C. Man, J. Mater. Process. Technol. 4430 (2000).
19. S. Kuper, J. Brannon, Appl. Phys. A: Solid and Surf. 57 (1993) 255.
20. S.G. Anderson, H.M. Meyer, L.J. Atanasoska, J.H. Weaver, J. Vac. Sci. Technol. A 6 (1988) 38.
21. J. Lu, S.V. Deshpande, E. Gulari, J. Kannicki, W.L. Warren, J. Appl. Phys. 80 (9) (1996) 5028.
22. Y. Momose, K. Ikawa, T. Sato, S. Okazaki, J. Appl. Polym. Sci. 33 (1987) 2715.
23. M.A. Golub, T. Wydeven, R.D. Cormia, Polymer 29 (1989) 285.
24. M. Inagaki, K. Sakamono, J. Mater. Res. 6 (1991) 1108.
25. T. Takeichi, Y. Eguchi, Y. Kaburagi, Y. Hishiyama, M. Inagaki, Carbon 37 (1999) 569.
26. H. Schmidt, J. Ihlemann, B. Wolff-Rottake, K. Luther, J. Troe, J. Appl. Phys. 83 (1998) 5458.
27. Y. Hishiyama, A. Yoshida, M. Inagaki, Carbon 36 (1998) 1113.
28. V.E. Yudin, M.Ya. Goykhman, K. Balik, P. Glogar, G.N. Gubanova, V.V. Kudriavtsev, Carbon 38 (2000) 5.
29. Y.V. Afanasiev, V.A. Isakov, I.N. Zavestovskaya, B.C. Chichkov, F. von Alvensleben, H. Welling, Appl. Phys. A 64 (1997) 561.
30. A. Misra, A. Mitra, R.K. Thareja, Appl. Phys. Lett. 74 (1999) 929.
31. V. Detalle, J.L. Lacour, P. Mauchien, A. Semerok, Appl. Surf. Sci. 138/139 (1999) 299.