SCOPUS 정보 검색 플랫폼

Volumn 76, Issue 7, 2003, Pages 1007-1012

Processing of vacuum microelectronic devices by focused ion and electron beams

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRON BEAMS; ION BEAMS; LEAKAGE CURRENTS;

MICROELECTRONIC DEVICES;

MICROELECTRONICS;

EID: 0037666250 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-002-1941-3 Document Type: Article

Times cited : (6)

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