Effect of real masks on wafer patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 54-62

  Spence, Chris ^a   Subramanian, Ramkumar ^a   Teng, David ^a   Gallardo, Ernie ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FEATURE EXTRACTION; MASKS;

OPTICAL PROXIMITY CORRECTION; WAFER PATTERNING;

PHOTOLITHOGRAPHY;

EID: 0033725663     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389052     Document Type: Conference Paper

References (5)