Performance of the improved JBX-9000MV e-beam lithography system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 736-745

  Komagata, T ^a   Nakagawa, Y ^a   Gotoh, N ^a   Tanaka, K ^a  

^a JEOL LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEFLECTION YOKES; ELECTRON BEAMS; ELECTRON SCATTERING; ERROR CORRECTION; IMAGE ANALYSIS; MASKS; OPTICAL DATA PROCESSING; PATTERN MATCHING; SHAPE MEMORY EFFECT; SIZE DETERMINATION;

VARIABLE SHAPED BEAMS (VSB);

ELECTRON BEAM LITHOGRAPHY;

EID: 0034759381     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436697     Document Type: Conference Paper

References (1)

1. Development of a next generation E-Beam lithography system for 1 Gbit DRAM masks