Implementation and characterization of a DUV raster-scanned mask pattern generation system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 16-37

  Bohan, Michael J ^a   Christopher Hamaker, H ^a   Montgomery, Warren ^a  

^a Applied Materials Company   (United States)

Author keywords

CAR; CW laser; DUV; Mask pattern generation system; Multibeam

Indexed keywords

CONTINUOUS WAVE LASERS; LASER APPLICATIONS; LIGHT SOURCES; PHOTOLITHOGRAPHY;

RASTER-SCANNED MASK PATTERNING;

MASKS;

EID: 0035765905     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458301     Document Type: Article

References (4)

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3. P. Warkentin and J. Schoeffel, "Scanning laser technology applied to high speed reticle writing", Optical Microlithography V, Proc.
4. G.A. Burns and J.A. Schoeffel, "Performance evaluation of the ATEQ CORE-2000 scanning laser reticle writer", Optical/Laser Microlithography, SPIE vol 772 (1987), pp. 55-64.