Characterizing partial coherence uniformity in a deep ultraviolet step and repeat tool

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2399-2403

  Watson, G Patrick ^a   Cirelli, Raymond A ^a   Mkrtchyan, Masis ^a   Travers, Richard J ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b Integrated Solutions Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038210173     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589655     Document Type: Article

References (5)

1. Y. Borodovsky, Proc. SPIE 2440, 750 (1995).
2. J. Kim, S. Oh, D. Lee, J. Yeo, Y. Yu, and J. Nam, presented at the SPIE 22nd Annual Symposium on Microlithography, Santa Clara, CA, 1997 [Proc. SPIE 3051, 54 (1997)].
3. J. Kim, S. Oh, D. Lee, J. Yeo, Y. Yu, and J. Nam, presented at the SPIE 22nd Annual Symposium on Microlithography, Santa Clara, CA, 1997 [Proc. SPIE 3051, 54 (1997)].
4. M. Born and E. Wolf, Principles of Optics (Pergamon, New York, 1959), p. 521.
5. SPLAT version 5.0 aerial image software, University of California, Berkeley.