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Volumn 82, Issue 15, 2003, Pages 2410-2412

Structure of stacking faults formed during the forward bias of 4h-SiC p-i-n diodes

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; DISLOCATIONS (CRYSTALS); EPITAXIAL GROWTH; IMAGING TECHNIQUES; LIGHT EMISSION; PLASTIC DEFORMATION; SEMICONDUCTOR JUNCTIONS; SHEAR STRESS; SILICON CARBIDE; STACKING FAULTS; STRAIN; TEMPERATURE; TENSILE STRESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0037624568     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1566794     Document Type: Article
Times cited : (65)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.