|
Volumn 82, Issue 15, 2003, Pages 2410-2412
|
Structure of stacking faults formed during the forward bias of 4h-SiC p-i-n diodes
|
Author keywords
[No Author keywords available]
|
Indexed keywords
COMPRESSIVE STRESS;
DISLOCATIONS (CRYSTALS);
EPITAXIAL GROWTH;
IMAGING TECHNIQUES;
LIGHT EMISSION;
PLASTIC DEFORMATION;
SEMICONDUCTOR JUNCTIONS;
SHEAR STRESS;
SILICON CARBIDE;
STACKING FAULTS;
STRAIN;
TEMPERATURE;
TENSILE STRESS;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
FORWARD BIASING;
SEMICONDUCTOR DIODES;
|
EID: 0037624568
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1566794 Document Type: Article |
Times cited : (65)
|
References (21)
|