Monitoring and purging dynamics of trace gaseous impurity in atmospheric pressure rapid thermal process

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 3, 2003, Pages 676-682

  Hu, Yao Zhi ^a   Tay, Sing Pin ^a  

^a MATTSON THERMAL PRODUCTS GMBH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; DISCOLORATION; MATHEMATICAL MODELS; PURGING; RAPID THERMAL ANNEALING;

IMPURITY PURGING; PURGING DYNAMICS; TITANIUM COATED WAFER; TRACE GASEOUS IMPURITY;

GAS DYNAMICS;

EID: 0037599261     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1564023     Document Type: Article

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