|
|
Volumn 470, Issue , 1997, Pages 245-251
|
|
In-situ oxygen monitoring of rapid thermal process chamber: Diagnosis of gas flow dynamics and wafer processing
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
COBALT;
DESORPTION;
GAS ADSORPTION;
GAS DYNAMICS;
IN SITU PROCESSING;
MONOLAYERS;
OXYGEN;
SURFACE CLEANING;
RAPID THERMAL PROCESS CHAMBER;
SILICIDATION;
HEAT TREATMENT;
|
|
EID: 0031338413
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-470-245 Document Type: Conference Paper |
|
Times cited : (3)
|
|
References (4)
|
