Residual gases and their influence on processes in the atmospheric rapid thermal processing equipment

Materials Research Society Symposium - Proceedings

Volumn 525, Issue , 1998, Pages 45-56

  Hu, Yao Zhi ^a   Tay, Sing Pin ^a  

^a AG Associates Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL SENSORS; HELIUM; MATHEMATICAL MODELS; NITROGEN; OXYGEN; PURGING; ULSI CIRCUITS;

PERFECTLY STIRRED TANK (PST) MODEL; QUADRUPOLE RESIDUAL GAS ANALYZERS; RAPID THERMAL PROCESSING (RTP);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031634410     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-525-45     Document Type: Conference Paper

References (5)