Conductivity behaviour of Cr implanted TiO2

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 191, Issue 1-4, 2002, Pages 158-162

  Silva, R C Da ^a,b   Alves, E ^a,b   Cruz, M M ^c  

^a Dep Física   (Portugal)

^b CENTRO DE FÍSICA NUCLEAR DA UNIVERSIDADE DE LISBOA   (Portugal)

^c UNIVERSITY OF LISBON   (Portugal)

Author keywords

Doping; Electrical conductivity; Ion implantation; Rutile (TiO2)

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CHROMIUM; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY MEASUREMENT; ION IMPLANTATION; POSITIVE IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR MATERIALS; SINGLE CRYSTALS;

RUTILE;

TITANIUM DIOXIDE;

EID: 0036573836     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00541-4     Document Type: Article

References (12)