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Volumn 136-138, Issue , 1998, Pages 442-446

Lattice site location and annealing behavior of W implanted TiO2

Author keywords

Damage recovery; Ion implantation; Lattice location; Rutile (TiO2)

Indexed keywords

ANISOTROPY; ANNEALING; CRYSTAL LATTICES; EPITAXIAL GROWTH; ION IMPLANTATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS; TUNGSTEN;

EID: 0032020996     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00726-X     Document Type: Article
Times cited : (7)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.